Extreme Ultraviolet (EUV) lithography is a critical technology for manufacturing semiconductor chips smaller than 7 ...

As US restrictions continue getting tougher, Chinese researchers are coming up with innovative approaches to chip ...

The LLNL-led initiative will evaluate the Big Aperture Thulium (BAT) laser technology to enhance EUV source efficiency by approximately tenfold compared to the current industry-standard CO2 lasers.

Clay Klein has been announced as the 2025 recipient of the $10,000 Nick Cobb Memorial Scholarship by SPIE, the international ...

The LLNL-led initiative will evaluate the Big Aperture Thulium (BAT) laser technology to enhance EUV source efficiency by approximately tenfold compared to the current industry-st ...

ASML’s EUV lithography technology is indispensable to the production of cutting-edge microchips, making it a linchpin of the ...

"Our work has already had quite an impact in the EUV lithography community, so now we’re excited to take this next step." The researchers plan to pair their compact high-repetition-rate BAT laser with ...

LLNL maintains that this could lead to a next-generation “beyond EUV” (BEUV) lithography system producing chips that are smaller, more powerful, and faster to manufacture while using less electricity.

The XUUS uses high-harmonic generation (HHG) of near-infrared light from a Ti:Sapphire laser to generate EUV wavelengths. The HHG process is analogous to conventional second- or third-harmonic ...

Intel is still betting big on Ireland with the company’s €17 billion Leixlip plant seen as “critical” to reversing the slide ...

The way these huge machines blast droplets of tin with a pulsed CO2 laser, then direct the EUV laser towards the silicon wafer, is something out of a sci-fi film. These ASML EUVL machines are used ...