As US restrictions continue getting tougher, Chinese researchers are coming up with innovative approaches to chip ...

The Lawrence Livermore National Laboratory is working on a petawatt-class thulium laser that is said to be 10 times more efficient than the CO2 lasers used in EUV tools and could replace CO2 ...

Extreme Ultraviolet (EUV) lithography is a critical technology for manufacturing semiconductor chips smaller than 7 ...

ASML’s EUV lithography technology is indispensable to the production of cutting-edge microchips, making it a linchpin of the ...

Intel is still betting big on Ireland with the company’s €17 billion Leixlip plant seen as “critical” to reversing the slide ...

The EUV pulse energy is often limited to avoid damage to the target or sample, so power scaling must be achieved by increasing the repetition rate of the laser.

A research partnership led by Lawrence Livermore National Laboratory (LLNL) has been formed to investigate the next evolution of extreme ultraviolet (EUV) lithography. The team will participate in the ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...

New approaches in the development of extreme ultraviolet (EUV) lithography are being pioneered by Chinese scientists, paving the way for the mass production of advanced semiconductor chips as ...

When you buy through links on our articles, Future and its syndication partners may earn a commission. Credit: Lawrence Livermore National Laboratory The Lawrence Livermore National Laboratory is ...