As US restrictions continue getting tougher, Chinese researchers are coming up with innovative approaches to chip ...

The Lawrence Livermore National Laboratory is working on a petawatt-class thulium laser that is said to be 10 times more efficient than the CO2 lasers used in EUV tools and could replace CO2 ...

Extreme Ultraviolet (EUV) lithography is a critical technology for manufacturing semiconductor chips smaller than 7 ...

ASML’s EUV lithography technology is indispensable to the production of cutting-edge microchips, making it a linchpin of the ...

However, the move from 193 nm excimer laser technology to 13.5 nm EUV technology has been far from straightforward, for a number of reasons. First, because EUV light is absorbed by air (in ...

Intel is still betting big on Ireland with the company’s €17 billion Leixlip plant seen as “critical” to reversing the slide ...

The way these huge machines blast droplets of tin with a pulsed CO2 laser, then direct the EUV laser towards the silicon wafer, is something out of a sci-fi film. These ASML EUVL machines are used ...

"Our work has already had quite an impact in the EUV lithography community, so now we’re excited to take this next step." The researchers plan to pair their compact high-repetition-rate BAT laser with ...

The XUUS uses high-harmonic generation (HHG) of near-infrared light from a Ti:Sapphire laser to generate EUV wavelengths. The HHG process is analogous to conventional second- or third-harmonic ...

The research team took a completely different technological approach from Western methods to generate EUV laser light. According to the institute’s website, the “discharge plasma extreme ...

The LLNL-led initiative will evaluate the Big Aperture Thulium (BAT) laser technology to enhance EUV source efficiency by approximately tenfold compared to the current industry-standard CO2 lasers.