Now, Intel is making sure that it is the first to adopt the second generation of the EUV tools by ASML featuring a 0.55 NA (high-NA) that provides higher resolution and productivity. Intel ...

The Extreme ULE is an evolution of the original ULE family that is meant to offer extreme thermal stability and a uniform glass material for next-generation High-NA EUV tools as well as future Low ...

with the first High Numerical Aperture (High-NA) EUV tools already installed. These complex machines promise to reduce ...

ASML faces cyclical pressures but remains strong in EUV lithography. See why ASML stock is a buy with 12% upside and ...

Providing both low NA and high NA EUV lithography machines to chip manufacturers, as well as DUV lithography and e-beam inspection tools. In this article, I will explore some of the critical ...

High-NA EUV lithography makes it possible to form fine patterns on silicon wafers with a higher resolution than previously possible, and is expected to lead to the realization of high-performance ...

TL;DR: ASML is selling a Lego set of its TWINSCAN EXE:5000 High-NA EUV lithography machine exclusively to employees for its 40th anniversary. Despite public interest, ASML confirmed it remains an ...

Samsung Electronics has reportedly launched a new EUV Task Force (TF) to enhance its extreme ultraviolet (EUV) technology and ...

At imec, Lam's 28nm pitch dry resist processes are paired with a low NA EUV scanner, and extendible to a high NA EUV scanner. They enhance EUV sensitivity and the resolution of each wafer pass ...

Japanese chipmaker Rapidus announced the delivery and installation of an ASML EUV lithography tool ... have a 0.33NA (numerical aperture), while its High-NA machines have a 0.55NA. Rapidus said a ...